Маска для лица Selfie Project Donut Worry Nourishing Glaze Wash-Off Mask

Aqua, Butyrospermum Parkii Butter, Caprylic/Capric Triglyceride,Dicaprylyl Carbonate, Glycerin, Bis-Diglyceryl Polyacyladipate-2, Propanediol, Steareth-2, Kaolin, Cetearyl Alcohol, Steareth-21, Squalane, Rosa Canina Fruit Extract, Fragaria Ananassa Fruit Extract, Rubus Idaeus Fruit Extract, Rubus Fruticosus Fruit Extract, Tocopherol, Helianthus Annuus Seed Oil, Charcoal Powder, Microcrystalline Cellulose, Cellulose, Mannitol, Sucrose, Oryza Sativa Starch, Zea Mays Starch, Xanthan Gum, Mica, Silica, Hydroxypropyl Methylcellulose, Aluminium Hydroxide, Ethylhexylglycerin, Sodium Benzoate, Potassium Sorbate, Phenoxyethanol, Parfum, Cl 11710, Cl 12490, Cl 73360, Cl 74260, Cl 74160, CI 77491, CI 77891.